skip to main content
DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Reflective optical imaging system for extreme ultraviolet wavelengths

Abstract

A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 .mu.m, and preferably less than 100 .mu.m. An image resolution of features less than 0.05-0.1 .mu.m, is obtained over a large area field; i.e., 25.4 mm .times.25.4 mm, with a distortion less than 0.1 of the resolution over the image field.

Inventors:
 [1];  [1]
  1. (Los Alamos, NM)
Issue Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM
OSTI Identifier:
868790
Patent Number(s):
5212588
Assignee:
United States of America as represented by United States (Washington, DC) LANL
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
reflective; optical; imaging; extreme; ultraviolet; wavelengths; projection; reflection; mirrors; coaxial; configuration; reproduce; image; spherical; surfaces; provide; resolution; feature; 200; preferably; 100; features; 05-0; obtained; field; 25; times; distortion; reflective optical; optical imaging; extreme ultraviolet; reflection surface; ultraviolet wavelength; reflection optical; /359/

Citation Formats

Viswanathan, Vriddhachalam K., and Newnam, Brian E. Reflective optical imaging system for extreme ultraviolet wavelengths. United States: N. p., 1993. Web.
Viswanathan, Vriddhachalam K., & Newnam, Brian E. Reflective optical imaging system for extreme ultraviolet wavelengths. United States.
Viswanathan, Vriddhachalam K., and Newnam, Brian E. Fri . "Reflective optical imaging system for extreme ultraviolet wavelengths". United States. https://www.osti.gov/servlets/purl/868790.
@article{osti_868790,
title = {Reflective optical imaging system for extreme ultraviolet wavelengths},
author = {Viswanathan, Vriddhachalam K. and Newnam, Brian E.},
abstractNote = {A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 .mu.m, and preferably less than 100 .mu.m. An image resolution of features less than 0.05-0.1 .mu.m, is obtained over a large area field; i.e., 25.4 mm .times.25.4 mm, with a distortion less than 0.1 of the resolution over the image field.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {1}
}

Patent:

Save / Share: