Reflective optical imaging system for extreme ultraviolet wavelengths

Title: Reflective optical imaging system for extreme ultraviolet wavelengths

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Abstract

A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 .mu.m, and preferably less than 100 .mu.m. An image resolution of features less than 0.05-0.1 .mu.m, is obtained over a large area field; i.e., 25.4 mm .times.25.4 mm, with a distortion less than 0.1 of the resolution over the image field.

Inventors:

Viswanathan, Vriddhachalam K ^[1]; Newnam, Brian E ^[1]

Los Alamos, NM

Issue Date:: 1993-01-01

Research Org.:: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

OSTI Identifier:: 868790

Patent Number(s):: 5212588

Assignee:: United States of America as represented by United States (Washington, DC)

Patent Classifications (CPCs):: G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/70233 - {Optical aspects of catoptric systems}

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B13/143 - {for use with ultra-violet radiation}
G02B17/061 - {on-axis systems with at least one of the mirrors having a central aperture}

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DOE Contract Number:: W-7405-ENG-36

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: reflective; optical; imaging; extreme; ultraviolet; wavelengths; projection; reflection; mirrors; coaxial; configuration; reproduce; image; spherical; surfaces; provide; resolution; feature; 200; preferably; 100; features; 05-0; obtained; field; 25; times; distortion; reflective optical; optical imaging; extreme ultraviolet; reflection surface; ultraviolet wavelength; reflection optical; /359/

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                    Viswanathan, Vriddhachalam K, and Newnam, Brian E. Reflective optical imaging system for extreme ultraviolet wavelengths.  United States: N. p., 1993. 
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                    Viswanathan, Vriddhachalam K, & Newnam, Brian E. Reflective optical imaging system for extreme ultraviolet wavelengths.  United States.

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                    Viswanathan, Vriddhachalam K, and Newnam, Brian E. Fri .  
        "Reflective optical imaging system for extreme ultraviolet wavelengths".  United States.  https://www.osti.gov/servlets/purl/868790.

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@article{osti_868790,

  title        = {Reflective optical imaging system for extreme ultraviolet wavelengths},

  author       = {Viswanathan, Vriddhachalam K and Newnam, Brian E},

  abstractNote = {A projection reflection optical system has two mirrors in a coaxial, four reflection configuration to reproduce the image of an object. The mirrors have spherical reflection surfaces to provide a very high resolution of object feature wavelengths less than 200 .mu.m, and preferably less than 100 .mu.m. An image resolution of features less than 0.05-0.1 .mu.m, is obtained over a large area field; i.e., 25.4 mm .times.25.4 mm, with a distortion less than 0.1 of the resolution over the image field.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1993},

  month        = {1}

}

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