DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Substrate for thin silicon solar cells

Abstract

A substrate for a photovoltaic device wherein the substrate is the base upon which photosensitive material is to be grown and the substrate comprises an alloy having boron in a range from 0.1 atomic % of the alloy to 1.3 atomic % of the alloy and the substrate has a resistivity less than 3.times.10.sup.-3 ohm-cm.

Inventors:
 [1]
  1. Evergreen, CO
Issue Date:
Research Org.:
Midwest Research Institute, Kansas City, MO (United States)
OSTI Identifier:
871736
Patent Number(s):
5785769
Assignee:
Midwest Research Institute (Kansas City, MO)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
DOE Contract Number:  
AC36-83CH10093
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
substrate; silicon; solar; cells; photovoltaic; device; base; photosensitive; material; grown; comprises; alloy; boron; range; atomic; resistivity; times; 10; -3; ohm-cm; substrate comprises; solar cell; solar cells; photovoltaic device; silicon solar; sensitive material; photosensitive material; /136/148/

Citation Formats

Ciszek, Theodore F. Substrate for thin silicon solar cells. United States: N. p., 1998. Web.
Ciszek, Theodore F. Substrate for thin silicon solar cells. United States.
Ciszek, Theodore F. Thu . "Substrate for thin silicon solar cells". United States. https://www.osti.gov/servlets/purl/871736.
@article{osti_871736,
title = {Substrate for thin silicon solar cells},
author = {Ciszek, Theodore F},
abstractNote = {A substrate for a photovoltaic device wherein the substrate is the base upon which photosensitive material is to be grown and the substrate comprises an alloy having boron in a range from 0.1 atomic % of the alloy to 1.3 atomic % of the alloy and the substrate has a resistivity less than 3.times.10.sup.-3 ohm-cm.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1998},
month = {Thu Jan 01 00:00:00 EST 1998}
}