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Title: Particle-free microchip processing

Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed.
Inventors:
 [1];  [2]
  1. (7723 Storrie Pl. NE., Albuquerque, NM 87109)
  2. (7217 Ottawa Rd. NE., Albuquerque, NM 87109)
Issue Date:
OSTI Identifier:
870442
Assignee:
Geller, Anthony S. (7723 Storrie Pl. NE., Albuquerque, NM 87109);Rader, Daniel J. (7217 Ottawa Rd. NE., Albuquerque, NM 87109) SNL
Patent Number(s):
US 5522933
Contract Number:
AC04-76DP00789
Research Org:
AT & T CORP
Country of Publication:
United States
Language:
English
Subject:
particle-free; microchip; processing; method; apparatus; reducing; particulate; contamination; disclosed; comprise; means; reduce; particle; velocity; wafer; particles; deposited; surface; reactor; electric; fields; prevent; porous; showerhead; velocities; processing method; reduce particle; electric field; electric fields; particulate contamination; wafer surface; apparatus comprise; particle velocity; microchip processing; reducing particulate; particle velocities; /118/

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