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Title: Particle-free microchip processing

Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed. 5 figs.
Inventors:
;
Issue Date:
OSTI Identifier:
242596
Assignee:
SNL; SCA: 426000; 320303; PA: EDB-96:094809; SN: 96001600398
Patent Number(s):
US 5,522,933/A/
Application Number:
PAN: 8-246,049
Contract Number:
AC04-76DP00789
Resource Relation:
Other Information: PBD: 4 Jun 1996
Research Org:
AT&T Corporation
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; 32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; MICROELECTRONIC CIRCUITS; FABRICATION; CHEMICAL REACTORS; DESIGN; IMPURITIES