Lubricated mechanical polishing

Cademartiri, Ludovico; Montoya, Briane Caroline

Title: Lubricated mechanical polishing

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Abstract

A lubricated mechanical polishing (LMP) process is provided that uses hard nanoparticles of less than 5 nm diameter dispersed in a fluid lubricant as a polishing slurry to produce an ultra-smooth surface on a hard metallic or non-metallic substrate with a sub-nanometer surface roughness substantially less than that produced by silica chemical mechanical polishing.

Inventors:: Cademartiri, Ludovico; Montoya, Briane Caroline

Issue Date:: 2019-10-15

Research Org.:: Ames Lab., Ames, IA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1600143

Patent Number(s):: 10442055

Application Number:: 15/530,575

Assignee:: Iowa State University Research Foundation, Inc. (Ames, IA)

Patent Classifications (CPCs):: C - CHEMISTRY C10 - PETROLEUM, GAS OR COKE INDUSTRIES C10N - INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS

C - CHEMISTRY C09 - DYES C09K - MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE

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C - CHEMISTRY C10 - PETROLEUM, GAS OR COKE INDUSTRIES C10N - INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
C10N2020/06 - Particles of special shape or size
C10N2040/25 - Internal combustion engines

C - CHEMISTRY C09 - DYES C09K - MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
C09K3/1472 - {Non-aqueous liquid suspensions}

C - CHEMISTRY C10 - PETROLEUM, GAS OR COKE INDUSTRIES C10M - LUBRICATING COMPOSITIONS
C10M125/10 - Metal oxides, hydroxides, carbonates or bicarbonates

B - PERFORMING OPERATIONS B24 - GRINDING B24B - MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
B24B37/044 - {characterised by the composition of the lapping agent}

C - CHEMISTRY C10 - PETROLEUM, GAS OR COKE INDUSTRIES C10N - INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
C10N2040/22 - with essential removal of material {, e.g. cutting

C - CHEMISTRY C09 - DYES C09K - MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
C09K3/1436 - {Composite particles, e.g. coated particles}

C - CHEMISTRY C10 - PETROLEUM, GAS OR COKE INDUSTRIES C10N - INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
C10N2080/00 - Special pretreatment of the material to be lubricated, e.g. phosphatising or chromatising of a metal

C - CHEMISTRY C10 - PETROLEUM, GAS OR COKE INDUSTRIES C10M - LUBRICATING COMPOSITIONS
C10M2201/062 - Oxides

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DOE Contract Number:: AC02-07CH11358

Resource Type:: Patent

Resource Relation:: Patent File Date: 01/31/2017

Country of Publication:: United States

Language:: English

Citation Formats


                    Cademartiri, Ludovico, and Montoya, Briane Caroline. Lubricated mechanical polishing.  United States: N. p., 2019. 
        Web.

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                    Cademartiri, Ludovico, & Montoya, Briane Caroline. Lubricated mechanical polishing.  United States.

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                    Cademartiri, Ludovico, and Montoya, Briane Caroline. Tue .  
        "Lubricated mechanical polishing".  United States.  https://www.osti.gov/servlets/purl/1600143.

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@article{osti_1600143,

  title        = {Lubricated mechanical polishing},

  author       = {Cademartiri, Ludovico and Montoya, Briane Caroline},

  abstractNote = {A lubricated mechanical polishing (LMP) process is provided that uses hard nanoparticles of less than 5 nm diameter dispersed in a fluid lubricant as a polishing slurry to produce an ultra-smooth surface on a hard metallic or non-metallic substrate with a sub-nanometer surface roughness substantially less than that produced by silica chemical mechanical polishing.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2019},

  month        = {10}

}

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