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Title: Transparent nanocrystalline diamond coatings and devices

Abstract

A method for coating a substrate comprises producing a plasma ball using a microwave plasma source in the presence of a mixture of gases. The plasma ball has a diameter. The plasma ball is disposed at a first distance from the substrate and the substrate is maintained at a first temperature. The plasma ball is maintained at the first distance from the substrate, and a diamond coating is deposited on the substrate. The diamond coating has a thickness. Furthermore, the diamond coating has an optical transparency of greater than about 80%. The diamond coating can include nanocrystalline diamond. The microwave plasma source can have a frequency of about 915 MHz.

Inventors:
;
Issue Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1576352
Patent Number(s):
10410860
Application Number:
15/676,895
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC02-06CH11357; W-31-109-ENG-38
Resource Type:
Patent
Resource Relation:
Patent File Date: 2017 Aug 14
Country of Publication:
United States
Language:
English

Citation Formats

Sumant, Anirudha V., and Khan, Adam. Transparent nanocrystalline diamond coatings and devices. United States: N. p., 2019. Web.
Sumant, Anirudha V., & Khan, Adam. Transparent nanocrystalline diamond coatings and devices. United States.
Sumant, Anirudha V., and Khan, Adam. Tue . "Transparent nanocrystalline diamond coatings and devices". United States. https://www.osti.gov/servlets/purl/1576352.
@article{osti_1576352,
title = {Transparent nanocrystalline diamond coatings and devices},
author = {Sumant, Anirudha V. and Khan, Adam},
abstractNote = {A method for coating a substrate comprises producing a plasma ball using a microwave plasma source in the presence of a mixture of gases. The plasma ball has a diameter. The plasma ball is disposed at a first distance from the substrate and the substrate is maintained at a first temperature. The plasma ball is maintained at the first distance from the substrate, and a diamond coating is deposited on the substrate. The diamond coating has a thickness. Furthermore, the diamond coating has an optical transparency of greater than about 80%. The diamond coating can include nanocrystalline diamond. The microwave plasma source can have a frequency of about 915 MHz.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {9}
}

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Works referenced in this record:

Semiconducting diamond and process for producing the same
patent, March 1991


Method of manufacturing diamond thermistors
patent, February 1993


Heat-resisting ohmic contact on semiconductor diamond layer
patent, July 1995


Passivation/patterning of PZR diamond films for high temperature operability
patent, April 1997


X-ray beam position monitor and its position measurement method
patent, February 1998


Method to grow pure nanocrystalline diamond films at low temperatures and high deposition rates
patent, July 2009


Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches
patent, January 2013


Transparent nanocrystalline diamond coatings and devices
patent, August 2017


Single crystal diamond prepared by CVD
patent-application, November 2004