Controlled fabrication of gaps in electrically conducting structures

Golovchenko, Jene A.; Schrmann, Gregor M.; King, Gavin M.; Branton, Daniel

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Title: Controlled fabrication of gaps in electrically conducting structures

Abstract

A method for controlling a gap in an electrically conducting solid state structure provided with a gap. The structure is exposed to a fabrication process environment conditions of which are selected to alter an extent of the gap. During exposure of the structure to the process environment, a voltage bias is applied across the gap. Electron tunneling current across the gap is measured during the process environment exposure and the process environment is controlled during process environment exposure based on tunneling current measurement. A method for controlling the gap between electrically conducting electrodes provided on a support structure. Each electrode has an electrode tip separated from other electrode tips by a gap. The electrodes are exposed to a flux of ions causing transport of material of the electrodes to corresponding electrode tips, locally adding material of the electrodes to electrode tips in the gap.

Inventors:: Golovchenko, Jene A.; Schrmann, Gregor M.; King, Gavin M.; Branton, Daniel

Issue Date:: 2009-09-01

Research Org.:: Harvard Univ., Cambridge, MA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1531597

Patent Number(s):: 7582490

Application Number:: 10/767,102

Assignee:: President and Fellows of Harvard College (Cambridge, MA)

Patent Classifications (CPCs):: G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

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G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
G01N33/48721 - {Investigating individual macromolecules, e.g. by translocation through nanopores

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T436/11 - Automated chemical analysis
Y10T436/12 - Condition responsive control

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DOE Contract Number:: FG02-01ER45922

Resource Type:: Patent

Resource Relation:: Patent File Date: 2004-01-29

Country of Publication:: United States

Language:: English

Citation Formats


                    Golovchenko, Jene A., Schrmann, Gregor M., King, Gavin M., and Branton, Daniel. Controlled fabrication of gaps in electrically conducting structures.  United States: N. p., 2009. 
        Web.

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                    Golovchenko, Jene A., Schrmann, Gregor M., King, Gavin M., & Branton, Daniel. Controlled fabrication of gaps in electrically conducting structures.  United States.

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                    Golovchenko, Jene A., Schrmann, Gregor M., King, Gavin M., and Branton, Daniel. Tue .  
        "Controlled fabrication of gaps in electrically conducting structures".  United States.  https://www.osti.gov/servlets/purl/1531597.

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@article{osti_1531597,

  title        = {Controlled fabrication of gaps in electrically conducting structures},

  author       = {Golovchenko, Jene A. and Schrmann, Gregor M. and King, Gavin M. and Branton, Daniel},

  abstractNote = {A method for controlling a gap in an electrically conducting solid state structure provided with a gap. The structure is exposed to a fabrication process environment conditions of which are selected to alter an extent of the gap. During exposure of the structure to the process environment, a voltage bias is applied across the gap. Electron tunneling current across the gap is measured during the process environment exposure and the process environment is controlled during process environment exposure based on tunneling current measurement. A method for controlling the gap between electrically conducting electrodes provided on a support structure. Each electrode has an electrode tip separated from other electrode tips by a gap. The electrodes are exposed to a flux of ions causing transport of material of the electrodes to corresponding electrode tips, locally adding material of the electrodes to electrode tips in the gap.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2009},

  month        = {9}

}

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