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Title: Patterning devices using fluorinated compounds

Abstract

A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a flourinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

Inventors:
;
Issue Date:
Research Org.:
Johns Hopkins Univ., Baltimore, MD (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531378
Patent Number(s):
10158075
Application Number:
15/722,856
Assignee:
The Johns Hopkins University (Baltimore, MD)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
FA9550-06-1-0076; FG02-07ER46465
Resource Type:
Patent
Resource Relation:
Patent File Date: 2017-10-02
Country of Publication:
United States
Language:
English

Citation Formats

Katz, Howard E., and Dhar, Bal Mukund. Patterning devices using fluorinated compounds. United States: N. p., 2018. Web.
Katz, Howard E., & Dhar, Bal Mukund. Patterning devices using fluorinated compounds. United States.
Katz, Howard E., and Dhar, Bal Mukund. Tue . "Patterning devices using fluorinated compounds". United States. https://www.osti.gov/servlets/purl/1531378.
@article{osti_1531378,
title = {Patterning devices using fluorinated compounds},
author = {Katz, Howard E. and Dhar, Bal Mukund},
abstractNote = {A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a flourinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {12}
}

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Works referenced in this record:

Patterning surfaces with functional polymers
journal, April 2008


Lateral lubistor structure and method
patent, February 2007


Photolithographic patterning of organic electronic materials
journal, February 2006


Patterning devices using fluorinated compounds
patent, October 2017


Flexible active-matrix displays and shift registers based on solution-processed organic transistors
journal, January 2004


Electric device
patent, October 1988


Patterning pentacene organic thin film transistors
journal, January 2002

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