Method for producing spatially patterned structures using fluorinated compounds
Abstract
A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.
- Inventors:
- Issue Date:
- Research Org.:
- Johns Hopkins Univ., Baltimore, MD (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531810
- Patent Number(s):
- 9091913
- Application Number:
- 12/864,407
- Assignee:
- The Johns Hopkins University (Baltimore, MD)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- DOE Contract Number:
- FG02-07ER46465
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2009-04-10
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Katz, Howard Edan, and Dhar, Bal Makund. Method for producing spatially patterned structures using fluorinated compounds. United States: N. p., 2015.
Web.
Katz, Howard Edan, & Dhar, Bal Makund. Method for producing spatially patterned structures using fluorinated compounds. United States.
Katz, Howard Edan, and Dhar, Bal Makund. Tue .
"Method for producing spatially patterned structures using fluorinated compounds". United States. https://www.osti.gov/servlets/purl/1531810.
@article{osti_1531810,
title = {Method for producing spatially patterned structures using fluorinated compounds},
author = {Katz, Howard Edan and Dhar, Bal Makund},
abstractNote = {A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {7}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referencing / citing this record:
Patterning devices using fluorinated compounds
patent, December 2018
- Katz, Howard Edan; Dhar, Bal Mukund
- US Patent Document 10,158,075
Photolithographic patterning of organic electronic devices
patent, February 2018
- DeFranco, John Andrew; O'Toole, Terrence Robert; Byrne, Frank Xavier
- US Patent Document 9,899,636
Patterning devices using fluorinated compounds
patent, October 2017
- Katz, Howard Edan; Dhar, Bal Mukund
- US Patent Document 9,806,259
Photolithographic patterning of electronic devices
patent, June 2018
- Robello, Douglas R.; O'Toole, Terrence Robert; Byrne, Frank Xavier
- US Patent Document 9,991,114