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Title: Method for producing spatially patterned structures using fluorinated compounds

Abstract

A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

Inventors:
;
Issue Date:
Research Org.:
Johns Hopkins Univ., Baltimore, MD (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531810
Patent Number(s):
9091913
Application Number:
12/864,407
Assignee:
The Johns Hopkins University (Baltimore, MD)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
FG02-07ER46465
Resource Type:
Patent
Resource Relation:
Patent File Date: 2009-04-10
Country of Publication:
United States
Language:
English

Citation Formats

Katz, Howard Edan, and Dhar, Bal Makund. Method for producing spatially patterned structures using fluorinated compounds. United States: N. p., 2015. Web.
Katz, Howard Edan, & Dhar, Bal Makund. Method for producing spatially patterned structures using fluorinated compounds. United States.
Katz, Howard Edan, and Dhar, Bal Makund. Tue . "Method for producing spatially patterned structures using fluorinated compounds". United States. https://www.osti.gov/servlets/purl/1531810.
@article{osti_1531810,
title = {Method for producing spatially patterned structures using fluorinated compounds},
author = {Katz, Howard Edan and Dhar, Bal Makund},
abstractNote = {A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2015},
month = {7}
}

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Works referencing / citing this record:

Patterning devices using fluorinated compounds
patent, December 2018


Photolithographic patterning of organic electronic devices
patent, February 2018


Patterning devices using fluorinated compounds
patent, October 2017


Photolithographic patterning of electronic devices
patent, June 2018