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Title: Patterning devices using fluorinated compounds

Abstract

A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

Inventors:
;
Issue Date:
Research Org.:
Johns Hopkins Univ., Baltimore, MD (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1532032
Patent Number(s):
9,806,259
Application Number:
15/226,411
Assignee:
The Johns Hopkins University (Baltimore, MD)
DOE Contract Number:  
FA9550-06-1-0076; FG02-07ER46465
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016-08-02
Country of Publication:
United States
Language:
English

Citation Formats

Katz, Howard E., and Dhar, Bal Mukund. Patterning devices using fluorinated compounds. United States: N. p., 2017. Web.
Katz, Howard E., & Dhar, Bal Mukund. Patterning devices using fluorinated compounds. United States.
Katz, Howard E., and Dhar, Bal Mukund. Tue . "Patterning devices using fluorinated compounds". United States. https://www.osti.gov/servlets/purl/1532032.
@article{osti_1532032,
title = {Patterning devices using fluorinated compounds},
author = {Katz, Howard E. and Dhar, Bal Mukund},
abstractNote = {A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2017},
month = {10}
}

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Works referenced in this record:

Electric device
patent, October 1988


Lateral lubistor structure and method
patent, February 2007


    Works referencing / citing this record:

    Patterning devices using fluorinated compounds
    patent, December 2018