Method for producing spatially patterned structures using fluorinated compounds

Patent · Tue Jul 28 00:00:00 EDT 2015

OSTI ID:1531810

Katz, Howard Edan; Dhar, Bal Makund

A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

• Research Organization: Johns Hopkins Univ., Baltimore, MD (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: FG02-07ER46465
• Assignee: The Johns Hopkins University (Baltimore, MD)
• Patent Number(s): 9,091,913
• Application Number: 12/864,407
• OSTI ID: 1531810
• Resource Relation: Patent File Date: 2009-04-10
• Country of Publication: United States
• Language: English