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Title: Trench process and structure for backside contact solar cells with polysilicon doped regions

Abstract

A solar cell includes polysilicon P-type and N-type doped regions on a backside of a substrate, such as a silicon wafer. An interrupted trench structure separates the P-type doped region from the N-type doped region in some locations but allows the P-type doped region and the N-type doped region to touch in other locations. Each of the P-type and N-type doped regions may be formed over a thin dielectric layer. Among other advantages, the resulting solar cell structure allows for increased efficiency while having a relatively low reverse breakdown voltage.

Inventors:
; ;
Issue Date:
Research Org.:
SunPower Corporation, San Jose, CA, USA
Sponsoring Org.:
USDOE
OSTI Identifier:
1127135
Patent Number(s):
8673673
Application Number:
13/872,961
Assignee:
SunPower Corporation (San Jose, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
DOE Contract Number:  
FC36-07G017043
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
14 SOLAR ENERGY

Citation Formats

De Ceuster, Denis, Cousins, Peter John, and Smith, David D. Trench process and structure for backside contact solar cells with polysilicon doped regions. United States: N. p., 2014. Web.
De Ceuster, Denis, Cousins, Peter John, & Smith, David D. Trench process and structure for backside contact solar cells with polysilicon doped regions. United States.
De Ceuster, Denis, Cousins, Peter John, and Smith, David D. Tue . "Trench process and structure for backside contact solar cells with polysilicon doped regions". United States. https://www.osti.gov/servlets/purl/1127135.
@article{osti_1127135,
title = {Trench process and structure for backside contact solar cells with polysilicon doped regions},
author = {De Ceuster, Denis and Cousins, Peter John and Smith, David D},
abstractNote = {A solar cell includes polysilicon P-type and N-type doped regions on a backside of a substrate, such as a silicon wafer. An interrupted trench structure separates the P-type doped region from the N-type doped region in some locations but allows the P-type doped region and the N-type doped region to touch in other locations. Each of the P-type and N-type doped regions may be formed over a thin dielectric layer. Among other advantages, the resulting solar cell structure allows for increased efficiency while having a relatively low reverse breakdown voltage.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 18 00:00:00 EDT 2014},
month = {Tue Mar 18 00:00:00 EDT 2014}
}

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Trench process and structure for backside contact solar cells with polysilicon doped regions
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patent-application, March 2006


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patent-application, July 2007


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patent-application, September 2008


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patent-application, September 2008


Trench Process and Structure for Backside Contact Solar Cells with Polysilicon Doped Regions
patent-application, December 2009


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patent-application, June 2010


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Trench Process and Structure for Backside Contact Solar Cells with Polysilicon Doped Regions
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patent-application, March 2011


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patent-application, January 2012