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Title: Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches

Abstract

An efficient deposition process is provided for fabricating reliable RF MEMS capacitive switches with multilayer ultrananocrystalline (UNCD) films for more rapid recovery, charging and discharging that is effective for more than a billion cycles of operation. Significantly, the deposition process is compatible for integration with CMOS electronics and thereby can provide monolithically integrated RF MEMS capacitive switches for use with CMOS electronic devices, such as for insertion into phase array antennas for radars and other RF communication systems.

Inventors:
; ;
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1082853
Patent Number(s):
8354290
Application Number:
13/080,255
Assignee:
UChicago Argonne, LLC (Argonne, IL)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01H - ELECTRIC SWITCHES
DOE Contract Number:  
ACO2-06CH11357
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Sumant, Anirudha V., Auciello, Orlando H., and Mancini, Derrick C. Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches. United States: N. p., 2013. Web.
Sumant, Anirudha V., Auciello, Orlando H., & Mancini, Derrick C. Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches. United States.
Sumant, Anirudha V., Auciello, Orlando H., and Mancini, Derrick C. Tue . "Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches". United States. https://www.osti.gov/servlets/purl/1082853.
@article{osti_1082853,
title = {Ultrananocrystalline diamond films with optimized dielectric properties for advanced RF MEMS capacitive switches},
author = {Sumant, Anirudha V. and Auciello, Orlando H. and Mancini, Derrick C.},
abstractNote = {An efficient deposition process is provided for fabricating reliable RF MEMS capacitive switches with multilayer ultrananocrystalline (UNCD) films for more rapid recovery, charging and discharging that is effective for more than a billion cycles of operation. Significantly, the deposition process is compatible for integration with CMOS electronics and thereby can provide monolithically integrated RF MEMS capacitive switches for use with CMOS electronic devices, such as for insertion into phase array antennas for radars and other RF communication systems.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 15 00:00:00 EST 2013},
month = {Tue Jan 15 00:00:00 EST 2013}
}

Works referenced in this record:

Microelectro-mechanical system actuator device and reconfigurable circuits utilizing same
patent, October 2000


Low temperature ceramic microelectromechanical structures
patent, December 2011