Optical constants of magnetron sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV

Soufli, R; Aquila, A L; Salmassi, F; Fernandez-Perea, M; Gullikson, E M

doi:10.1364/AO.47.004633

Optical constants of magnetron sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV

Journal Article · Wed May 21 04:00:00 EDT 2008 · Applied Optics

DOI:https://doi.org/10.1364/AO.47.004633· OSTI ID:945867

Soufli, R; Aquila, A L; Salmassi, F; Fernandez-Perea, M; Gullikson, E M

This work discusses the experimental determination of the optical constants (refractive index) of DC-magnetron-sputtered boron carbide films in the 30-770 eV photon energy range. Transmittance measurements of three boron carbide films with thicknesses of 54.2, 79.0 and 112.5 nm were performed for this purpose. These are the first published experimental data for the refractive index of boron carbide films in the photon energy range above 160 eV, and for the near-edge x-ray absorption fine structure (NEXAFS) regions around the boron K (188 eV), carbon K (284.2 eV) and oxygen K (543.1 eV) absorption edges. The density, composition, surface chemistry and morphology of the films in this manuscript were also investigated using Rutherford Backscattering (RBS), X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), and extreme ultraviolet (EUV) reflectance measurements.

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Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA

Sponsoring Organization:: USDOE

DOE Contract Number:: W-7405-ENG-48

OSTI ID:: 945867

Report Number(s):: LLNL-JRNL-404257

Journal Information:: Applied Optics, Journal Name: Applied Optics Journal Issue: 25 Vol. 47; ISSN 0003-6935; ISSN APOPAI

Country of Publication:: United States

Language:: English

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