Optical constants of magnetron sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV
This work discusses the experimental determination of the optical constants (refractive index) of DC-magnetron-sputtered boron carbide films in the 30-770 eV photon energy range. Transmittance measurements of three boron carbide films with thicknesses of 54.2, 79.0 and 112.5 nm were performed for this purpose. These are the first published experimental data for the refractive index of boron carbide films in the photon energy range above 160 eV, and for the near-edge x-ray absorption fine structure (NEXAFS) regions around the boron K (188 eV), carbon K (284.2 eV) and oxygen K (543.1 eV) absorption edges. The density, composition, surface chemistry and morphology of the films in this manuscript were also investigated using Rutherford Backscattering (RBS), X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), and extreme ultraviolet (EUV) reflectance measurements.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 945867
- Report Number(s):
- LLNL-JRNL-404257; APOPAI; TRN: US200903%%844
- Journal Information:
- Applied Optics, Vol. 47, Issue 25; ISSN 0003-6935
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
71 CLASSICAL AND QUANTUMM MECHANICS
GENERAL PHYSICS
ABSORPTION
ATOMIC FORCE MICROSCOPY
BACKSCATTERING
BORON
BORON CARBIDES
CARBON
CHEMISTRY
ENERGY RANGE
FINE STRUCTURE
MAGNETRONS
MORPHOLOGY
OXYGEN
PHOTONS
REFRACTIVE INDEX
RUTHERFORD BACKSCATTERING SPECTROSCOPY
SCANNING ELECTRON MICROSCOPY
THIN FILMS
X-RAY PHOTOELECTRON SPECTROSCOPY