skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Optical constants of magnetron sputtered boron carbide thin films from photoabsorption data in the range 30 to 770 eV

Journal Article · · Applied Optics

This work discusses the experimental determination of the optical constants (refractive index) of DC-magnetron-sputtered boron carbide films in the 30-770 eV photon energy range. Transmittance measurements of three boron carbide films with thicknesses of 54.2, 79.0 and 112.5 nm were performed for this purpose. These are the first published experimental data for the refractive index of boron carbide films in the photon energy range above 160 eV, and for the near-edge x-ray absorption fine structure (NEXAFS) regions around the boron K (188 eV), carbon K (284.2 eV) and oxygen K (543.1 eV) absorption edges. The density, composition, surface chemistry and morphology of the films in this manuscript were also investigated using Rutherford Backscattering (RBS), X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), and extreme ultraviolet (EUV) reflectance measurements.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
945867
Report Number(s):
LLNL-JRNL-404257; APOPAI; TRN: US200903%%844
Journal Information:
Applied Optics, Vol. 47, Issue 25; ISSN 0003-6935
Country of Publication:
United States
Language:
English

References (23)

Structures and properties of disordered boron carbide coatings generated by magnetron sputtering journal November 1998
Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering journal March 1999
Recent developments in EUV reflectometry at the Advanced Light Source
  • Gullikson, Eric M.; Mrowka, Stanley; Kaufmann, Benjamin B.
  • 26th Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.436712
conference August 2001
Ion beam synthesis of boron carbide thin films journal September 2002
Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials journal January 1998
Damage threshold of inorganic solids under free-electron-laser irradiation at 32.5nm wavelength journal April 2007
Soft x-ray mirrors for the Linac Coherent Light Source conference September 2007
Sub-diffraction-limited multilayer coatings for the 03 numerical aperture micro-exposure tool for extreme ultraviolet lithography journal January 2007
Properties of RF sputtered B4C thin films journal June 1994
Synthesis of boron carbide films by ion beam sputtering journal June 2000
Preparation of thin films of carbon-based compounds journal September 2003
High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50–1300eV energy region journal May 1998
Process–property relationship of boron carbide thin films by magnetron sputtering journal February 2004
Extreme ultraviolet optical properties of ion-beam-deposited boron carbide thin films
  • Blumenstock, Gerry M.; Keski-Kuha, Ritva A. M.; Ginter, Marshal L.
  • SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, SPIE Proceedings https://doi.org/10.1117/12.212622
conference June 1995
Photoemission and x-ray-absorption study of boron carbide and its surface thermal stability journal May 1998
Superconvergence and Sum Rules for the Optical Constants journal December 1972
The modification of mechanical properties and adhesion of boron carbide sputtered films by ion implantation journal October 1996
X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92 journal July 1993
Absolute photoabsorption measurements of molybdenum in the range 60–930 eV for optical constant determination journal January 1998
Ion-beam-deposited boron carbide coatings for the extreme ultraviolet journal January 1994
Optical properties of hot-pressed B_4C in the extreme ultraviolet journal January 2000
Soft X-ray absorption spectroscopy in 100 – 1000 eV region at the ALS journal May 1996
Absolute photoabsorption measurements of Mg, Al, and Si in the soft-x-ray region below the L 2 , 3 edges journal June 1994