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Structures And Fabrication Techniques For Solid State Electrochemical Devices

Patent ·
OSTI ID:879847

Provided are low-cost, mechanically strong, highly electronically conductive porous substrates and associated structures for solid-state electrochemical devices, techniques for forming these structures, and devices incorporating the structures. The invention provides solid state electrochemical device substrates of novel composition and techniques for forming thin electrode/membrane/electrolyte coatings on the novel or more conventional substrates. In particular, in one embodiment the invention provides techniques for co-firing of device substrate (often an electrode) with an electrolyte or membrane layer to form densified electrolyte/membrane films 5 to 20 microns thick. In another embodiment, densified electrolyte/membrane films 5 to 20 microns thick may be formed on a pre-sintered substrate by a constrained sintering process. In some cases, the substrate may be a porous metal, alloy, or non-nickel cermet incorporating one or more of the transition metals Cr, Fe, Cu and Ag, or alloys thereof.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
DOE Contract Number:
AC03-76SF00098
Assignee:
The Regents of The University of California (Oakland, CA)
Patent Number(s):
US 6,979,511
Application Number:
10/273812
OSTI ID:
879847
Country of Publication:
United States
Language:
English

References (5)

Development of Metallic Substrate Supported Thin-Film SOFC by Applying Plasma Spray Techniques journal January 1999
Microstructures of Y2O3-Stabilized ZrO2 Electron Beam-Physical Vapor Deposition Coatings on Ni-Base Superalloys journal April 1994
Development of Plasma Sprayed Components for a New SOFC Design journal January 1997
High Potential Performance of Tubular Type SOFC Using Metallic System Components journal January 1997
Improved preparation procedure and properties for a multilayer piezoelectric thick-film actuator journal November 1998

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