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Process for making dense thin films

Patent ·
OSTI ID:1175435
Provided are low-cost, mechanically strong, highly electronically conductive porous substrates and associated structures for solid-state electrochemical devices, techniques for forming these structures, and devices incorporating the structures. The invention provides solid state electrochemical device substrates of novel composition and techniques for forming thin electrode/membrane/electrolyte coatings on the novel or more conventional substrates. In particular, in one embodiment the invention provides techniques for firing of device substrate to form densified electrolyte/membrane films 5 to 20 microns thick. In another embodiment, densified electrolyte/membrane films 5 to 20 microns thick may be formed on a pre-sintered substrate by a constrained sintering process. In some cases, the substrate may be a porous metal, alloy, or non-nickel cermet incorporating one or more of the transition metals Cr, Fe, Cu and Ag, or alloys thereof.
Research Organization:
The Regents of the University of California, Oakland, CA (United States)
Sponsoring Organization:
USDOE
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Number(s):
6,921,557
Application Number:
10/323,137
OSTI ID:
1175435
Country of Publication:
United States
Language:
English

References (2)

Improved preparation procedure and properties for a multilayer piezoelectric thick-film actuator journal November 1998
Karl Marx : l'utopie, la raison et la sience journal January 1999

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