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MoRu/Be multilayers for extreme ultraviolet applications

Patent ·
OSTI ID:873711
 [1];  [2]
  1. Livermore, CA
  2. Stockton, CA
+ Show Author Affiliations

High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 6228512
OSTI ID:
873711
Country of Publication:
United States
Language:
English

References (5)

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography conference June 1998
Molybdenum–ruthenium/beryllium multilayer coatings journal March 2000
Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity journal January 2000
Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet journal January 1995
Beryllium-Based Multilayer Structures journal January 1995

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