skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: MoRu/Be multilayers for extreme ultraviolet applications

Patent ·
OSTI ID:873711
 [1];  [2]
  1. Livermore, CA
  2. Stockton, CA
+ Show Author Affiliations

High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 6228512
OSTI ID:
873711
Country of Publication:
United States
Language:
English

References (5)

Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet journal January 1995
Beryllium-Based Multilayer Structures journal January 1995
Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography conference June 1998
Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity journal January 2000
Molybdenum–ruthenium/beryllium multilayer coatings journal March 2000

Similar Records

Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
Journal Article · Thu Jul 01 00:00:00 EDT 1999 · Optical Engineering · OSTI ID:873711
Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography applications
Conference · Fri Feb 20 00:00:00 EST 1998 · OSTI ID:873711
Molybdenum-ruthenium/beryllium multilayer coatings
Journal Article · Wed Mar 01 00:00:00 EST 2000 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:873711

Related Subjects

moru
multilayers
extreme
ultraviolet
applications
reflectance
intrinsic
roughness
stress
multilayer
systems
euv
lithography
comprise
amorphous
layers
crystalline
70
demonstrated
50
bilayer
pairs
optical
throughput
30-40
coatings
improved
diffusion
barrier
sharper
interfaces
capping
layer
top
surface
improves
long-term
radiation
stability
forming
native
oxide
water
resistant
multilayer coatings
multilayer coating
diffusion barrier
top surface
extreme ultraviolet
euv radiation
multilayer systems
layer pairs
stress multilayer
radiation stability
amorphous layer
/428/