Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography

Journal Article · Sat Apr 01 04:00:00 EST 2000 · Applied Optics

DOI:https://doi.org/10.1364/AO.39.001617· OSTI ID:20216727

Mirkarimi, Paul B ^[1]; Bajt, Sasa ^[1]; Wall, Mark A ^[1]

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1. Lawrence Livermore National Laboratory, Mail Stop L-395, 7000 East Avenue, Livermore, California 94550 (United States)

Multilayer-coated Zerodur optics are expected to play a pivotal role in an extreme-ultraviolet (EUV) lithography tool. Zerodur is a multiphase, multicomponent material that is a much more complicated substrate than commonly used single-crystal Si or fused-silica substrates. We investigate the effect of Zerodur substrates on the performance of high-EUV reflectance Mo/Si and Mo/Be multilayer thin films. For Mo/Si the EUV reflectance had a nearly linear dependence on substrate roughness for roughness values of 0.06-0.36 nm rms, and the FWHM of the reflectance curves (spectral bandwidth) was essentially constant over this range. For Mo/Be the EUV reflectance was observed to decrease more steeply than Mo/Si for roughness values greater than approximately 0.2-0.3 nm. Little difference was observed in the EUV reflectivity of multilayer thin films deposited on different substrates as long as the substrate roughness values were similar. (c) 2000 Optical Society of America.

• OSTI ID: 20216727
• Journal Information: Applied Optics, Journal Name: Applied Optics Journal Issue: 10 Vol. 39; ISSN 0003-6935; ISSN APOPAI
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BERYLLIUM
EXPERIMENTAL DATA
EXTREME ULTRAVIOLET SPECTRA
LAMELLAE
MOLYBDENUM
PHYSICAL RADIATION EFFECTS
REFLECTIVE COATINGS
SILICON
STRESS ANALYSIS