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Title: High numerical aperture ring field projection system for extreme ultraviolet lithography

Abstract

An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receive a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

Inventors:
 [1];  [2]
  1. (218 Eastridge Dr., San Ramon, CA 94583-4905)
  2. (56 Drake La., Fairfield, CT 06430-2925)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
873554
Patent Number(s):
US 6188513
Assignee:
Hudyma, Russell (218 Eastridge Dr., San Ramon, CA 94583-4905);Shafer, David R. (56 Drake La., Fairfield, CT 06430-2925) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
numerical; aperture; field; projection; extreme; ultraviolet; lithography; all-reflective; optical; photolithography; camera; source; euv; radiation; wafer; mask; imaged; convex; mirror; third; fourth; concave; fifth; sixth; configured; five; six; mirrors; receive; chief; ray; incidence; angle; substantially; degree; receives; 14; reflecting; surfaces; aspheric; departure; 12; 16; mirrors receives; all-reflective optical; reflective optical; numerical aperture; reflecting surfaces; aspheric departure; ultraviolet lithography; extreme ultraviolet; reflecting surface; concave mirror; six mirrors; chief ray; convex mirror; euv radiation; six reflecting; incidence angle; sixth concave; third convex; fifth convex; field projection; fourth concave; projection photolithography; photolithography camera; mirrors receive; lithography camera; /359/

Citation Formats

Hudyma, Russell, and Shafer, David R. High numerical aperture ring field projection system for extreme ultraviolet lithography. United States: N. p., 2001. Web.
Hudyma, Russell, & Shafer, David R. High numerical aperture ring field projection system for extreme ultraviolet lithography. United States.
Hudyma, Russell, and Shafer, David R. Mon . "High numerical aperture ring field projection system for extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/873554.
@article{osti_873554,
title = {High numerical aperture ring field projection system for extreme ultraviolet lithography},
author = {Hudyma, Russell and Shafer, David R.},
abstractNote = {An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receive a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}

Patent:

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