High numerical aperture ring field projection system for extreme ultraviolet lithography
- 218 Eastridge Dr., San Ramon, CA 94583-4905
An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 .mu.m.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Hudyma; Russell (218 Eastridge Dr., San Ramon, CA 94583-4905)
- Patent Number(s):
- US 6318869
- OSTI ID:
- 874124
- Country of Publication:
- United States
- Language:
- English
Design of reflective relay for soft x-ray lithography
|
conference | January 1991 |
EUV optical design for a 100-nm CD imaging system
|
conference | June 1998 |
Optical system design issues in development of projection camera for EUV lithography
|
conference | May 1995 |
Similar Records
High numerical aperture ring field projection system for extreme ultraviolet lithography
High numerical aperture ring field projection system for extreme ultraviolet lithography
Related Subjects
aperture
field
projection
extreme
ultraviolet
lithography
all-reflective
optical
photolithography
camera
source
euv
radiation
wafer
mask
imaged
concave
mirror
third
convex
fourth
fifth
sixth
configured
five
six
mirrors
receives
chief
ray
incidence
angle
substantially
12degree
15degree
reflecting
surfaces
aspheric
departure
mum
14
160
extreme ultraviolet
reflecting surface
incidence angle
all-reflective optical
projection photolithography
photolithography camera
field projection
/359/