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Title: High numerical aperture ring field projection system for extreme ultraviolet lithography

Abstract

An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.

Inventors:
 [1]
  1. (218 Eastridge Dr., San Ramon, CA 84583-4905)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
872886
Patent Number(s):
US 6033079
Assignee:
Hudyma, Russell (218 Eastridge Dr., San Ramon, CA 84583-4905) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
numerical; aperture; field; projection; extreme; ultraviolet; lithography; all-refelctive; optical; photolithography; camera; source; euv; radiation; wafer; mask; imaged; concave; mirror; third; convex; fourth; fifth; sixth; configured; five; six; mirrors; receives; chief; ray; incidence; angle; substantially; 12; degree; 15; reflecting; surfaces; aspheric; departure; 14; refelecting; 16; mirrors receives; numerical aperture; reflecting surfaces; aspheric departure; ultraviolet lithography; extreme ultraviolet; reflecting surface; concave mirror; six mirrors; chief ray; convex mirror; euv radiation; six reflecting; incidence angle; sixth concave; third convex; fifth convex; field projection; fourth concave; projection photolithography; photolithography camera; mirrors receive; lithography camera; /359/378/

Citation Formats

Hudyma, Russell. High numerical aperture ring field projection system for extreme ultraviolet lithography. United States: N. p., 2000. Web.
Hudyma, Russell. High numerical aperture ring field projection system for extreme ultraviolet lithography. United States.
Hudyma, Russell. Sat . "High numerical aperture ring field projection system for extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/872886.
@article{osti_872886,
title = {High numerical aperture ring field projection system for extreme ultraviolet lithography},
author = {Hudyma, Russell},
abstractNote = {An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

Patent:

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