Pulsed ion beam source

Patent · Wed Jan 01 04:00:00 EST 1997

OSTI ID:871094

Greenly, John B ^[1]

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1. Lansing, NY

An improved pulsed ion beam source having a new biasing circuit for the fast magnetic field. This circuit provides for an initial negative bias for the field created by the fast coils in the ion beam source which pre-ionize the gas in the source, ionize the gas and deliver the gas to the proper position in the accelerating gap between the anode and cathode assemblies in the ion beam source. The initial negative bias improves the interaction between the location of the nulls in the composite magnetic field in the ion beam source and the position of the gas for pre-ionization and ionization into the plasma as well as final positioning of the plasma in the accelerating gap. Improvements to the construction of the flux excluders in the anode assembly are also accomplished by fabricating them as layered structures with a high melting point, low conductivity material on the outsides with a high conductivity material in the center.

• Research Organization: SANDIA CORP
• DOE Contract Number: AC04-94AL85000
• Assignee: Sandia Corporation (Albuquerque, NM)
• Patent Number(s): US 5656819
• OSTI ID: 871094
• Country of Publication: United States
• Language: English

Related Subjects

/250/315/
accelerating
accelerating gap
accomplished
anode
anode assembly
assemblies
assembly
beam
beam source
bias
biasing
cathode
cathode assemblies
center
circuit
circuit provides
coils
composite
conductivity
conductivity material
construction
created
deliver
excluders
fabricating
fast
fast coil
field
field created
final
flux
gap
gas
improved
improvements
improves
initial
interaction
ionization
ionize
layered
layered structure
location
magnetic
magnetic field
material
melting
negative
negative bias
nulls
outsides
plasma
position
positioning
pre-ionization
pre-ionize
proper
proper position
provides
pulsed
source
structures