Skip to main content
OSTI.GOVU.S. Department of Energy Office of Scientific and Technical Information
U.S. Department of Energy
Office of Scientific and Technical Information
 

Pulsed ion beam source

Patent ·
OSTI ID:870461
 [1]
  1. Lansing, NY
+ Show Author Affiliations
An improved magnetically-confined anode plasma pulsed ion beam source. Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure and the slow field structure near the anode of the ion beam source, by a gas port design which localizes the gas delivery into the gap between the fast coil and the anode, by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means which optimally adjusts the plasma formation position in the ion beam source.
Research Organization:
AT & T CORP
DOE Contract Number:
AC04-76DP00789
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5525805
OSTI ID:
870461
Country of Publication:
United States
Language:
English

Similar Records

Pulsed ion beam source
Patent · Tue Dec 31 23:00:00 EST 1996 · OSTI ID:871094
Pulsed ion beam source
Patent · Tue Aug 12 00:00:00 EDT 1997 · OSTI ID:527753
Active plasma source formation in the MAP diode
Conference · Sat Jul 01 00:00:00 EDT 1995 · OSTI ID:90660

Related Subjects

/250/315/
adjusts
anode
beam
beam source
bias
bias field
circuit
circuit connected
coil
connected
delivery
design
effects
efficiency
fast
fast coil
field
field flux
field means
flux
formation
gap
gas
gas delivery
improved
improved magnetic
localizes
magnetic
magnetically-confined
means
near
optimally
plasma
plasma formation
position
power
power efficiency
pre-ionizer
pulsed
ringing
rotation
separatrix
slow
source
structure