Pulsed ion beam source

Patent · Wed Jan 01 00:00:00 EST 1997

OSTI ID:871094

Greenly, John B ^[1]

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1. Lansing, NY

An improved pulsed ion beam source having a new biasing circuit for the fast magnetic field. This circuit provides for an initial negative bias for the field created by the fast coils in the ion beam source which pre-ionize the gas in the source, ionize the gas and deliver the gas to the proper position in the accelerating gap between the anode and cathode assemblies in the ion beam source. The initial negative bias improves the interaction between the location of the nulls in the composite magnetic field in the ion beam source and the position of the gas for pre-ionization and ionization into the plasma as well as final positioning of the plasma in the accelerating gap. Improvements to the construction of the flux excluders in the anode assembly are also accomplished by fabricating them as layered structures with a high melting point, low conductivity material on the outsides with a high conductivity material in the center.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: Sandia Corporation (Albuquerque, NM)
• Patent Number(s): US 5656819
• OSTI ID: 871094
• Country of Publication: United States
• Language: English

Related Subjects

pulsed
beam
source
improved
biasing
circuit
fast
magnetic
field
provides
initial
negative
bias
created
coils
pre-ionize
gas
ionize
deliver
proper
position
accelerating
gap
anode
cathode
assemblies
improves
interaction
location
nulls
composite
pre-ionization
ionization
plasma
final
positioning
improvements
construction
flux
excluders
assembly
accomplished
fabricating
layered
structures
melting
conductivity
material
outsides
center
layered structure
circuit provides
anode assembly
magnetic field
beam source
accelerating gap
proper position
negative bias
field created
cathode assemblies
conductivity material
fast coil
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