ECR ion source with electron gun

Patent · Fri Jan 01 04:00:00 EST 1993

OSTI ID:868989

Xie, Zu Q ^[1]; Lyneis, Claude M ^[2]

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1. El Cerrito, CA
2. Berkeley, CA

An Advanced Electron Cyclotron Resonance ion source (10) having an electron gun (52) for introducing electrons into the plasma chamber (18) of the ion source (10). The ion source (10) has a injection enclosure (12) and a plasma chamber tank (14). The plasma chamber (18) is defined by a plurality of longitudinal magnets (16). The electron gun (52) injects electrons axially into the plasma chamber (18) such that ionization within the plasma chamber (18) occurs in the presence of the additional electrons produced by the electron gun (52). The electron gun (52) has a cathode (116) for emitting electrons therefrom which is heated by current supplied from an AC power supply (96) while bias potential is provided by a bias power supply (118). A concentric inner conductor (60) and Outer conductor (62) carry heating current to a carbon chuck (104) and carbon pusher (114) Which hold the cathode (116) in place and also heat the cathode (16). In the Advanced Electron Cyclotron Resonance ion source (10), the electron gun (52) replaces the conventional first stage used in prior art electron cyclotron resonance ion generators.

• Research Organization: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
• DOE Contract Number: AC03-76SF00098
• Assignee: United States of America as represented by Department of Energy (Washington, DC)
• Patent Number(s): US 5256938
• OSTI ID: 868989
• Country of Publication: United States
• Language: English

Related Subjects

/315/313/
10
104
114
116
118
12
14
16
18
52
60
62
96
additional
additional electrons
advanced
axially
bias
bias potential
carbon
carry
carry heat
cathode
chamber
chuck
concentric
concentric inner
conductor
conventional
current
current supplied
cyclotron
cyclotron resonance
defined
ecr
electron
electron cyclotron
electron gun
electrons
emitting
enclosure
generators
gun
heat
heated
heating
heating current
hold
injection
injects
inner
inner conductor
introducing
ionization
longitudinal
magnets
occurs
outer
outer conductor
plasma
plasma chamber
plurality
potential
power
power supply
presence
prior
produced
provided
pusher
replaces
resonance
source
stage
supplied
supply
tank
therefrom