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Title: ECR ion source with electron gun

Patent ·
OSTI ID:5418886

An Advanced Electron Cyclotron Resonance ion source having an electron gun for introducing electrons into the plasma chamber of the ion source is described. The ion source has a injection enclosure and a plasma chamber tank. The plasma chamber is defined by a plurality of longitudinal magnets. The electron gun injects electrons axially into the plasma chamber such that ionization within the plasma chamber occurs in the presence of the additional electrons produced by the electron gun. The electron gun has a cathode for emitting electrons therefrom which is heated by current supplied from an AC power supply while bias potential is provided by a bias power supply. A concentric inner conductor and outer conductor carry heating current to a carbon chuck and carbon pusher which hold the cathode in place and also heat the cathode. In the Advanced Electron Cyclotron Resonance ion source, the electron gun replaces the conventional first stage used in prior electron cyclotron resonance ion generators. 5 figures.

DOE Contract Number:
AC03-76SF00098
Assignee:
Dept. of Energy, Washington, DC (United States)
Patent Number(s):
US 5256938; A
Application Number:
PPN: US 7-843335
OSTI ID:
5418886
Resource Relation:
Patent File Date: 28 Feb 1992
Country of Publication:
United States
Language:
English