Enhanced ECR ion source performance with an electron gun

Journal Article · Fri Mar 01 04:00:00 EST 1991 · Review of Scientific Instruments; (USA)

DOI:https://doi.org/10.1063/1.1142083· OSTI ID:5770080

Xie, Z; Lyneis, C M; Lam, R S; Lundgren, S A ^[1]

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1. Nuclear Science Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (US)

An electron gun for the advanced electron cyclotron resonance (AECR) source has been developed to increase the production of high charge state ions. The AECR source, which operates at 14 GHz, is being developed for the 88-in. cyclotron at Lawrence Berkeley Laboratory. The electron gun injects 10 to 150 eV electrons into the plasma chamber of the AECR. With the electron gun the AECR has produced at 10 kV extraction voltage 131 e {mu}A of O{sup 7+}, 13 e {mu}A of O{sup 8+}, 17 e {mu}A of Ar{sup 14+}, 2.2 e {mu}A of Kr{sup 25+}, 1 e {mu}A of Xe{sup 31+}, and 0.2 e {mu}A of Bi{sup 38+}. The AECR was also tested as a single stage source with a coating of SiO{sub 2} on the plasma chamber walls. This significantly improved its performance compared to no coating, but direct injection of electrons with the electron gun produced the best results.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 5770080
• Journal Information: Review of Scientific Instruments; (USA), Journal Name: Review of Scientific Instruments; (USA) Vol. 62:3; ISSN RSINA; ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
430301* -- Particle Accelerators-- Ion Sources
ACCELERATORS
BEAM INJECTION
BEAM-PLASMA SYSTEMS
CHALCOGENIDES
COATINGS
CYCLIC ACCELERATORS
CYCLOTRON RESONANCE
CYCLOTRONS
ELECTRON CYCLOTRON-RESONANCE
ELECTRON GUNS
ION SOURCES
OXIDES
OXYGEN COMPOUNDS
PERFORMANCE
RESONANCE
SILICON COMPOUNDS
SILICON OXIDES