Ionization chamber dosimeter

Patent · Mon Dec 31 23:00:00 EST 1990

OSTI ID:868046

Renner, Tim R ^[1]; Nyman, Mark A ^[1]; Stradtner, Ronald ^[2]

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1. Berkeley, CA
2. Kensington, CA

A method for fabricating an ion chamber dosimeter collecting array of the type utilizing plural discrete elements formed on a uniform collecting surface which includes forming a thin insulating layer over an aperture in a frame having surfaces, forming a predetermined pattern of through holes in the layer, plating both surfaces of the layer and simultaneously tilting and rotating the frame for uniform plate-through of the holes between surfaces. Aligned masking and patterned etching of the surfaces provides interconnects between the through holes and copper leads provided to external circuitry.

• Research Organization: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
• DOE Contract Number: AC03-76SF00098
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 5061216
• OSTI ID: 868046
• Country of Publication: United States
• Language: English

Related Subjects

/445/427/
aligned
aperture
array
chamber
chamber dosimeter
circuitry
collecting
collecting surface
copper
discrete
dosimeter
elements
elements formed
etching
external
external circuit
external circuitry
fabricating
formed
forming
frame
holes
insulating
insulating layer
interconnects
ionization
ionization chamber
layer
leads
masking
method
pattern
patterned
plate-through
plating
plural
predetermined
predetermined pattern
provided
provides
rotating
simultaneously
surface
surfaces
tilting
type
type utilizing
uniform
utilizing