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Title: Poly(silyl silane) homo and copolymers

Abstract

Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

Inventors:
 [1]
  1. 2208 Lester Dr. NE., Albuquerque, NM 87112
Publication Date:
Research Org.:
AT & T CORP
OSTI Identifier:
867936
Patent Number(s):
US 5039593
Assignee:
Zeigler, John K. (2208 Lester Dr. NE., Albuquerque, NM 87112)
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
poly; silyl; silane; homo; copolymers; silanes; prepared; photosensitivity; excellent; resistance; oxygen-reactive; etching; processes; useful; photodepolymerizable; photoresists; barrier; layers; etc; etching process; barrier layer; barrier layers; silyl silanes; silyl silane; excellent resistance; etching processes; photodepolymerizable photoresists; /430/

Citation Formats

Zeigler, John K. Poly(silyl silane) homo and copolymers. United States: N. p., 1991. Web.
Zeigler, John K. Poly(silyl silane) homo and copolymers. United States.
Zeigler, John K. Tue . "Poly(silyl silane) homo and copolymers". United States. https://www.osti.gov/servlets/purl/867936.
@article{osti_867936,
title = {Poly(silyl silane) homo and copolymers},
author = {Zeigler, John K},
abstractNote = {Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1991},
month = {1}
}

Patent:

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