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Poly(silyl silane) homo and copolymers

Patent ·
OSTI ID:867936
 [1]
  1. 2208 Lester Dr. NE., Albuquerque, NM 87112
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Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

Research Organization:
AT & T CORP
DOE Contract Number:
AC04-76DP00789
Assignee:
Zeigler, John K. (2208 Lester Dr. NE., Albuquerque, NM 87112)
Patent Number(s):
US 5039593
OSTI ID:
867936
Country of Publication:
United States
Language:
English

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Related Subjects

/430/
barrier
barrier layer
barrier layers
copolymers
etc
etching
etching process
etching processes
excellent
excellent resistance
homo
layers
oxygen-reactive
photodepolymerizable
photodepolymerizable photoresists
photoresists
photosensitivity
poly
prepared
processes
resistance
silane
silanes
silyl
silyl silane
silyl silanes
useful