Poly(silyl silane) homo and copolymers
Patent
·
OSTI ID:7027889
Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- SNL; EDB-94-110986
- Patent Number(s):
- A; US 5039593
- Application Number:
- PPN: US 7-331122
- OSTI ID:
- 7027889
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360600 -- Other Materials
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
42 ENGINEERING
426000 -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
CHEMICAL PREPARATION
CHEMICAL REACTIONS
DECOMPOSITION
DEPOLYMERIZATION
ELECTRONIC CIRCUITS
ETCHING
FABRICATION
MASKING
ORGANIC COMPOUNDS
ORGANIC POLYMERS
ORGANIC SILICON COMPOUNDS
PHOTOSENSITIVITY
POLYMERS
SENSITIVITY
SURFACE FINISHING
SYNTHESIS
USES
360600 -- Other Materials
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
42 ENGINEERING
426000 -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
CHEMICAL PREPARATION
CHEMICAL REACTIONS
DECOMPOSITION
DEPOLYMERIZATION
ELECTRONIC CIRCUITS
ETCHING
FABRICATION
MASKING
ORGANIC COMPOUNDS
ORGANIC POLYMERS
ORGANIC SILICON COMPOUNDS
PHOTOSENSITIVITY
POLYMERS
SENSITIVITY
SURFACE FINISHING
SYNTHESIS
USES