Poly(silyl silane)homo and copolymers
Patent
·
OSTI ID:7267147
Poly(silyl silanes) have been prepared. They have high photosensitivity and show excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- John M. Zeigler, Albuquerque, NM (United States)
- Patent Number(s):
- A; US 4820788
- Application Number:
- PPN: US 6-925552
- OSTI ID:
- 7267147
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500* -- Photochemistry
42 ENGINEERING
426000 -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
CHEMICAL PREPARATION
HYDRIDES
HYDROGEN COMPOUNDS
MASKING
MATERIALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHOTOSENSITIVITY
SENSITIVITY
SILANES
SILICON COMPOUNDS
SYNTHESIS
400500* -- Photochemistry
42 ENGINEERING
426000 -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
CHEMICAL PREPARATION
HYDRIDES
HYDROGEN COMPOUNDS
MASKING
MATERIALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHOTOSENSITIVITY
SENSITIVITY
SILANES
SILICON COMPOUNDS
SYNTHESIS