skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Poly(silyl silane)homo and copolymers

Abstract

Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

Inventors:
 [1]
  1. 2208 Lester Dr. NE., Albuquerque, NM 87112
Publication Date:
Research Org.:
AT & T CORP
OSTI Identifier:
866913
Patent Number(s):
US 4820788
Assignee:
John M. Zeigler (Albuquerque, NM)
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
poly; silyl; silane; homo; copolymers; silanes; prepared; photosensitivity; excellent; resistance; oxygen-reactive; etching; processes; useful; photodepolymerizable; photoresists; barrier; layers; etc; etching process; barrier layer; barrier layers; silyl silanes; silyl silane; excellent resistance; etching processes; photodepolymerizable photoresists; /528/430/999/

Citation Formats

Zeigler, John M. Poly(silyl silane)homo and copolymers. United States: N. p., 1989. Web.
Zeigler, John M. Poly(silyl silane)homo and copolymers. United States.
Zeigler, John M. Sun . "Poly(silyl silane)homo and copolymers". United States. https://www.osti.gov/servlets/purl/866913.
@article{osti_866913,
title = {Poly(silyl silane)homo and copolymers},
author = {Zeigler, John M},
abstractNote = {Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {1}
}

Patent:

Save / Share: