Poly(silyl silane)homo and copolymers
Patent
·
OSTI ID:866913
- 2208 Lester Dr. NE., Albuquerque, NM 87112
Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
- Research Organization:
- AT&T
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- John M. Zeigler (Albuquerque, NM)
- Patent Number(s):
- US 4820788
- OSTI ID:
- 866913
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
poly
silyl
silane
homo
copolymers
silanes
prepared
photosensitivity
excellent
resistance
oxygen-reactive
etching
processes
useful
photodepolymerizable
photoresists
barrier
layers
etc
etching process
barrier layer
barrier layers
silyl silanes
silyl silane
excellent resistance
etching processes
photodepolymerizable photoresists
/528/430/999/
silyl
silane
homo
copolymers
silanes
prepared
photosensitivity
excellent
resistance
oxygen-reactive
etching
processes
useful
photodepolymerizable
photoresists
barrier
layers
etc
etching process
barrier layer
barrier layers
silyl silanes
silyl silane
excellent resistance
etching processes
photodepolymerizable photoresists
/528/430/999/