Poly(silyl silane)homo and copolymers
Patent
·
OSTI ID:866913
- 2208 Lester Dr. NE., Albuquerque, NM 87112
Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
- Research Organization:
- AT & T CORP
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- John M. Zeigler (Albuquerque, NM)
- Patent Number(s):
- US 4820788
- OSTI ID:
- 866913
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
/528/430/999/
barrier
barrier layer
barrier layers
copolymers
etc
etching
etching process
etching processes
excellent
excellent resistance
homo
layers
oxygen-reactive
photodepolymerizable
photodepolymerizable photoresists
photoresists
photosensitivity
poly
prepared
processes
resistance
silane
silanes
silyl
silyl silane
silyl silanes
useful
barrier
barrier layer
barrier layers
copolymers
etc
etching
etching process
etching processes
excellent
excellent resistance
homo
layers
oxygen-reactive
photodepolymerizable
photodepolymerizable photoresists
photoresists
photosensitivity
poly
prepared
processes
resistance
silane
silanes
silyl
silyl silane
silyl silanes
useful