Laser-driven fusion etching process

Patent · Sun Jan 01 04:00:00 EST 1989

OSTI ID:866996

Ashby, Carol I. H. ^[1]; Brannon, Paul J ^[2]; Gerardo, James B ^[2]

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1. Edgewood, NM
2. Albuquerque, NM

The surfaces of solid ionic substrates are etched by a radiation-driven chemical reaction. The process involves exposing an ionic substrate coated with a layer of a reactant material on its surface to radiation, e.g. a laser, to induce localized melting of the substrate which results in the occurrance of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic salt substrates, e.g., a solid inorganic salt such as LiNbO.sub.3, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.

• Research Organization: AT & T CORP
• DOE Contract Number: AC04-76DP00789
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 4838989
• OSTI ID: 866996
• Country of Publication: United States
• Language: English

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/216/427/430/
acousto-optic
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especially
especially suitable
etched
etching
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excess
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rapid
rate
reactant
reactant material
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relatively
relatively inert
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salt
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solid
solid inorganic
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