Laser-driven fusion etching process

Patent · Tue Aug 25 04:00:00 EDT 1987

OSTI ID:6743626

Ashby, C I.H.; Brannon, P J; Gerardo, J B

The surfaces of solids are etched by a radiation-driven chemical reaction. The process involves exposing a substrate coated with a layer of a reactant material on its surface to radiation, e.g., a laser, to induce localized melting of the substrate which results in the occurrence of a fusion reaction between the substrate and coating material. The resultant reaction product and excess reactant salt are then removed from the surface of the substrate with a solvent which is relatively inert towards the substrate. The laser-driven chemical etching process is especially suitable for etching ionic substrates, e.g., LiNbO/sub 3/, such as used in electro-optical/acousto-optic devices. It is also suitable for applications wherein the etching process is required to produce an etched ionic substrate having a smooth surface morphology or when a very rapid etching rate is desired.

• Research Organization: Sandia National Labs., Albuquerque, NM (USA)
• DOE Contract Number: AC04-76DP00789
• Assignee: SNL; ERA-14-001153; EDB-88-184934
• Patent Number(s): PATENTS-US-A6089206
• OSTI ID: 6743626
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
360605 -- Materials-- Radiation Effects
ALKALI METAL COMPOUNDS
CHALCOGENIDES
CHEMICAL REACTIONS
COATINGS
ELECTROMAGNETIC RADIATION
ETCHING
INVENTIONS
LASER RADIATION
LITHIUM COMPOUNDS
LITHIUM OXIDES
NIOBATES
NIOBIUM COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
RADIATION EFFECTS
RADIATIONS
REFRACTORY METAL COMPOUNDS
SUBSTRATES
SURFACE FINISHING
TANTALUM COMPOUNDS
TANTALUM OXIDES
TRANSITION ELEMENT COMPOUNDS
USES