Apparatus and method for photochemical vapor deposition

Patent · Tue Mar 31 00:00:00 EST 1987

OSTI ID:866202

Jackson, Scott C ^[1]; Rocheleau, Richard E ^[1]

---

1. Wilmington, DE

A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.

• Research Organization: Solar Energy Research Institute
• DOE Contract Number: XB-4-04061
• Assignee: University of Delaware (Newark, DE)
• Patent Number(s): US 4654226
• Application Number: 06/835,331
• OSTI ID: 866202
• Country of Publication: United States
• Language: English

Related Subjects

apparatus
method
photochemical
vapor
deposition
reactor
housing
window
wall
reaction
chamber
transparent
curtain
divides
zone
flush
substrate
mounted
light
communication
ultraviolet
radiation
penetrate
kept
gas
flowing
ultraviolet radiation
chemical vapor
gas flow
reaction chamber
reaction zone
vapor deposition
gas flowing
deposition apparatus
photochemical vapor
/427/118/