Apparatus and method for photochemical vapor deposition

Patent · Tue Mar 31 04:00:00 EST 1987

OSTI ID:866202

Jackson, Scott C ^[1]; Rocheleau, Richard E ^[1]

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1. Wilmington, DE

A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.

• Research Organization: Solar Energy Research Institute
• Assignee: University of Delaware (Newark, DE)
• Patent Number(s): US 4654226
• Application Number: 06/835,331
• OSTI ID: 866202
• Country of Publication: United States
• Language: English

Related Subjects

/427/118/
apparatus
chamber
chemical vapor
communication
curtain
deposition
deposition apparatus
divides
flowing
flush
gas
gas flow
gas flowing
housing
kept
light
method
mounted
penetrate
photochemical
photochemical vapor
radiation
reaction
reaction chamber
reaction zone
reactor
substrate
transparent
ultraviolet
ultraviolet radiation
vapor
vapor deposition
wall
window
zone