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Title: Apparatus and method for photochemical vapor deposition

Abstract

A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.

Inventors:
 [1];  [1]
  1. Wilmington, DE
Publication Date:
Research Org.:
Solar Energy Research Institute
OSTI Identifier:
866202
Patent Number(s):
US 4654226
Application Number:
06/835,331
Assignee:
University of Delaware (Newark, DE)
DOE Contract Number:  
XB-4-04061
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
apparatus; method; photochemical; vapor; deposition; reactor; housing; window; wall; reaction; chamber; transparent; curtain; divides; zone; flush; substrate; mounted; light; communication; ultraviolet; radiation; penetrate; kept; gas; flowing; ultraviolet radiation; chemical vapor; gas flow; reaction chamber; reaction zone; vapor deposition; gas flowing; deposition apparatus; photochemical vapor; /427/118/

Citation Formats

Jackson, Scott C, and Rocheleau, Richard E. Apparatus and method for photochemical vapor deposition. United States: N. p., 1987. Web.
Jackson, Scott C, & Rocheleau, Richard E. Apparatus and method for photochemical vapor deposition. United States.
Jackson, Scott C, and Rocheleau, Richard E. 1987. "Apparatus and method for photochemical vapor deposition". United States. https://www.osti.gov/servlets/purl/866202.
@article{osti_866202,
title = {Apparatus and method for photochemical vapor deposition},
author = {Jackson, Scott C and Rocheleau, Richard E},
abstractNote = {A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.},
doi = {},
url = {https://www.osti.gov/biblio/866202}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 31 00:00:00 EST 1987},
month = {Tue Mar 31 00:00:00 EST 1987}
}