Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Sputter target

Patent ·
OSTI ID:863599
The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.
Research Organization:
Bendix Corp., Kansas City, MO (USA)
DOE Contract Number:
EY-76-C-04-0613
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 4209375
OSTI ID:
863599
Country of Publication:
United States
Language:
English

Similar Records

Sputter target
Patent · Tue Jun 24 00:00:00 EDT 1980 · OSTI ID:5203937

Sputter target
Patent · Tue Jun 24 00:00:00 EDT 1980 · OSTI ID:7007535

High temperature, bonded titanium diboride sputter target
Technical Report · Thu Oct 01 00:00:00 EDT 1981 · OSTI ID:5726307