Aerosol-assisted chemical vapor deposition (AACVD) of binary alloy films: Studies of film composition

Conference · Tue Aug 01 04:00:00 EDT 1995

OSTI ID:82576

Xu, C; Hampden-Smith, M J ^[1]; Kodas, T T ^[2]

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1. Univ. of New Mexico, Albuquerque, NM (United States). Dept. of Chemistry
2. Univ. of New Mexico, Albuquerque, NM (United States). Dept. of Chemical Engineering

The chemical vapor deposition (CVD) of Cu-Ag and Cu-Pd alloys using aerosol precursor delivery over a range of preheating temperatures, 70 {approximately} 80 C and substrate temperatures, 250 {approximately} 300 C is described. The precursors used include Cu(hfac){sub 2}, (hfac)Ag(SEt{sub 2}) and Pd(hfac){sub 2} dissolved in toluene and 10% H{sub 2} in Ar as carrier gas. The films were characterized by SEM, EDS and X-ray diffraction (XRD). The X-ray diffraction results showed the Cu/Ag films were composed of {alpha}- and {beta}-phases of Cu-Ag alloys, the Cu/Pd films were Cu-Pd and Pd-Ag alloy, solid solutions, under these conditions. Compositional variation studies in Cu-Pd and Pd-Ag alloy systems were also conducted by mixing Cu(hfac){sub 2}/Pd(hfac){sub 2} and (hfac) Ag(SEt{sub 2})/Pd(hfac){sub 2} in toluene solution in different ratios. The films were characterized by X-ray diffraction and the results showed the composition of films was affected by the solution stoichiometry.

• OSTI ID: 82576
• Report Number(s): CONF-941144--; ISBN 1-55899-264-2
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AEROSOLS
ARGON
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
COPPER ALLOYS
HYDROGEN
ORGANOMETALLIC COMPOUNDS
PALLADIUM ALLOYS
SCANNING ELECTRON MICROSCOPY
SILICON OXIDES
SILVER ALLOYS
SOLID SOLUTIONS
STOICHIOMETRY
TOLUENE
X-RAY DIFFRACTION