Chemical vapor deposition of refractory metals and ceramics III
- ed.; Stevens Inst. of Tech., Hoboken, NJ (United States)
- ed.; Oak Ridge National Lab., TN (United States)
- ed.; Morton International, Woburn, MA (United States)
The papers contained in this volume were originally presented at Symposium K on Chemical Vapor Deposition of Refractory Metals and Ceramics III, held at the Fall Meeting of the Materials Research Society in Boston, Massachusetts, on November 28--30, 1994. This symposium was sponsored by Morton International Inc., Advanced Materials, and by The Department of Energy-Oak Ridge National Laboratory. The purpose of this symposium was to exchange scientific information on the chemical vapor deposition (CVD) of metallic and ceramic materials. CVD technology is receiving much interest in the scientific community, in particular, to synthesize new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), ``smart`` material structures and nanocomposites are some examples of new classes of materials being produced via CVD. As rapid progress is being made in many interdisciplinary research areas, this symposium is intended to provide a forum for reporting new scientific results and addressing technological issues relevant to CVD materials and processes. Thirty four papers have been processed separately for inclusion on the data base.
- OSTI ID:
- 82544
- Report Number(s):
- CONF-941144--; ISBN 1-55899-264-2
- Country of Publication:
- United States
- Language:
- English
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