Covalent ceramics III -- Science and technology of non-oxides

Conference · Mon Dec 30 23:00:00 EST 1996

OSTI ID:470879

Hepp, A F ^[1]; Kumta, P N ^[2]; Sullivan, J J ^[3]; Fischman, G S ^[4]; Kaloyeros, A E ^[5]

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1. ed.; National Aeronautics and Space Administration, Cleveland, OH (United States). Lewis Research Center
2. ed.; Carnegie Mellon Univ., Pittsburgh, PA (United States)
3. ed.; MKS Instruments, Andover, MA (United States)
4. ed.; Food and Drug Administration, Rockville, MD (United States)
5. ed.; Univ. of Albany, NY (United States)

The symposium, Covalent Ceramics III: Science and Technology of Non-Oxides, was held November 27--30, 1995, in Boston, Massachusetts and was sponsored by the Materials Research Society. Researchers with a broad range of interests participated in the symposium to present the state-of-the-art in each area and to discuss the fundamental aspects and technological relevance of the wide range of non-oxide materials. The multidisciplinary nature of the symposium can be seen from a sampling of the topics covered in this volume. These include: fundamental issues in MOCVD processing; structural characterization and electronic and optoelectronic device fabrication of Al and Ga nitrides; a new class of GaAs devices enabled by CVD-deposition of cubic GaS from an organometallic gallium sulfide complex and its potential in the fabrication of MISFETS; use of carbon nanotubes to produce nanorods of TiC, NbC, and SiC, as well as characterization of the properties of the nanorods; a simple electrochemical method for producing a number of different transition-metal and main-group metal nitrides; preparation of ternary nitrides via solid oxide or via post treatment of new molecular precursors; new precursors for CVD and other thin-film techniques for depositing barrier layers of TiN for microelectronic applications; fundamental issues related to processing, characterization, and properties of SiC; processing issues of thin-film solar cells; and fabrication of several transition metal-carbides, nitrides and carbonitride thin films and their application as hard materials. Sixty seven papers were processed separately for inclusion on the data base.

• OSTI ID: 470879
• Report Number(s): CONF-951155--; ISBN 1-55899-313-4
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CERAMICS
DOPED MATERIALS
ELECTRONIC EQUIPMENT
EPITAXY
LEADING ABSTRACT
MEETINGS
MICROSTRUCTURE
PHASE STUDIES
PHYSICAL PROPERTIES
REACTION KINETICS
SEMICONDUCTOR MATERIALS
SYNTHESIS
THIN FILMS