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Magnetic field effect on the sheath thickness in plasma immersion ion implantation

Journal Article · Wed Aug 07 04:00:00 EDT 2002 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.1499516· OSTI ID:801983

Keidar, M ^[1]; Monteiro, O R; Anders, A; Boyd, I D

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Research Organization:: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)

Sponsoring Organization:: USDOE Director, Office of Science (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 801983

Report Number(s):: LBNL--51262

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 7 Vol. 81; ISSN APPLAB; ISSN 0003-6951

Country of Publication:: United States

Language:: English

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Related Subjects

36 MATERIALS SCIENCE
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ION IMPLANTATION
MAGNETIC FIELDS
PLASMA
THICKNESS