Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation

Journal Article · Tue Mar 15 04:00:00 EDT 2016 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.4944503· OSTI ID:22599085

Here, a collisional magnetized plasma with finite ion temperature is considered to examine the effects of the ion temperature and gas pressure on the plasma-sheath dynamics. We use the two-fluid model of plasma-sheath where the nonlinear equations of a dynamic sheath are solved using a full implicit scheme of finite difference method along with some convenient initial and boundary conditions at the plasma center and target. It is found that the ion temperature only has a significant effect on the characteristics of low voltage sheath, while the gas pressure (collision rate) seriously affects the dynamic characteristics of the low and high voltage plasma-sheath. One can see, increasing the ion temperature in low voltage plasma-sheath causes to increase the temporal curve of the ion dose and the ion impact energy on the target, reduces the temporal curve of the sheath width, and has no any effect on the temporal curve of the ion incident angle on the target. However, rising the gas pressure in low and high voltage plasma-sheath reduces all of these temporal curves.

• OSTI ID: 22599085
• Journal Information: Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 3 Vol. 23; ISSN PHPAEN; ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BOUNDARY CONDITIONS
DIAGRAMS
ELECTRIC POTENTIAL
FINITE DIFFERENCE METHOD
ION IMPLANTATION
ION TEMPERATURE
IONS
NONLINEAR PROBLEMS
PLASMA SHEATH
PRESSURE DEPENDENCE