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Title: Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation

Abstract

Here, a collisional magnetized plasma with finite ion temperature is considered to examine the effects of the ion temperature and gas pressure on the plasma-sheath dynamics. We use the two-fluid model of plasma-sheath where the nonlinear equations of a dynamic sheath are solved using a full implicit scheme of finite difference method along with some convenient initial and boundary conditions at the plasma center and target. It is found that the ion temperature only has a significant effect on the characteristics of low voltage sheath, while the gas pressure (collision rate) seriously affects the dynamic characteristics of the low and high voltage plasma-sheath. One can see, increasing the ion temperature in low voltage plasma-sheath causes to increase the temporal curve of the ion dose and the ion impact energy on the target, reduces the temporal curve of the sheath width, and has no any effect on the temporal curve of the ion incident angle on the target. However, rising the gas pressure in low and high voltage plasma-sheath reduces all of these temporal curves.

Authors:
 [1]; ;  [2]
  1. Department of Physics, Borujerd Branch, Islamic Azad University, Borujerd (Iran, Islamic Republic of)
  2. Laser and Plasma Research Institute, Shahid Beheshti University, Evin, 1983963113 Tehran (Iran, Islamic Republic of)
Publication Date:
OSTI Identifier:
22599085
Resource Type:
Journal Article
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 23; Journal Issue: 3; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1070-664X
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BOUNDARY CONDITIONS; DIAGRAMS; ELECTRIC POTENTIAL; FINITE DIFFERENCE METHOD; ION IMPLANTATION; ION TEMPERATURE; IONS; NONLINEAR PROBLEMS; PLASMA SHEATH; PRESSURE DEPENDENCE

Citation Formats

Khoram, M., E-mail: m.khoramabadi@srbiau.ac.ir, Ghomi, H., E-mail: h-gmdashty@sbu.ac.ir, and Navab Safa, N., E-mail: n-navabsafa@sbu.ac.ir. Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation. United States: N. p., 2016. Web. doi:10.1063/1.4944503.
Khoram, M., E-mail: m.khoramabadi@srbiau.ac.ir, Ghomi, H., E-mail: h-gmdashty@sbu.ac.ir, & Navab Safa, N., E-mail: n-navabsafa@sbu.ac.ir. Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation. United States. doi:10.1063/1.4944503.
Khoram, M., E-mail: m.khoramabadi@srbiau.ac.ir, Ghomi, H., E-mail: h-gmdashty@sbu.ac.ir, and Navab Safa, N., E-mail: n-navabsafa@sbu.ac.ir. Tue . "Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation". United States. doi:10.1063/1.4944503.
@article{osti_22599085,
title = {Ion temperature and gas pressure effects on the magnetized sheath dynamics during plasma immersion ion implantation},
author = {Khoram, M., E-mail: m.khoramabadi@srbiau.ac.ir and Ghomi, H., E-mail: h-gmdashty@sbu.ac.ir and Navab Safa, N., E-mail: n-navabsafa@sbu.ac.ir},
abstractNote = {Here, a collisional magnetized plasma with finite ion temperature is considered to examine the effects of the ion temperature and gas pressure on the plasma-sheath dynamics. We use the two-fluid model of plasma-sheath where the nonlinear equations of a dynamic sheath are solved using a full implicit scheme of finite difference method along with some convenient initial and boundary conditions at the plasma center and target. It is found that the ion temperature only has a significant effect on the characteristics of low voltage sheath, while the gas pressure (collision rate) seriously affects the dynamic characteristics of the low and high voltage plasma-sheath. One can see, increasing the ion temperature in low voltage plasma-sheath causes to increase the temporal curve of the ion dose and the ion impact energy on the target, reduces the temporal curve of the sheath width, and has no any effect on the temporal curve of the ion incident angle on the target. However, rising the gas pressure in low and high voltage plasma-sheath reduces all of these temporal curves.},
doi = {10.1063/1.4944503},
journal = {Physics of Plasmas},
issn = {1070-664X},
number = 3,
volume = 23,
place = {United States},
year = {2016},
month = {3}
}