A one-dimensional collisional model for plasma-immersion ion implantation

Journal Article · Thu Feb 14 23:00:00 EST 1991 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.348774· OSTI ID:5832207

Vahedi, V; Lieberman, M A; Alves, M V; Verboncoeur, J P; Birdsall, C K ^[1]

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1. Plasma Theory and Simulation Group, University of California, Berkeley, California 94720 (US)

Plasma-immersion ion implantation (also known as plasma-source ion implantation) is a process in which a target is immersed in a plasma and a series of large negative-voltage pulses are applied to it to extract ions from the plasma and implant them into the target. A general one-dimensional model is developed to study this process in different coordinate systems for the case in which the pressure of the neutral gas is large enough that the ion motion in the sheath can be assumed to be highly collisional.

• DOE Contract Number: FG03-87ER13727
• OSTI ID: 5832207
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 69:4; ISSN JAPIA; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

656002* -- Condensed Matter Physics-- General Techniques in Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
COLLISIONS
DIFFERENTIAL EQUATIONS
ELECTRIC POTENTIAL
EQUATIONS
EQUATIONS OF MOTION
HIGH PRESSURE
ION IMPLANTATION
MATHEMATICAL MODELS
ONE-DIMENSIONAL CALCULATIONS
PARTIAL DIFFERENTIAL EQUATIONS
PLASMA
PULSES
SOLIDS