Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography
Journal Article
·
· Applied Physics B: Lasers and Optics
OSTI ID:800575
- LBNL Library
No abstract prepared.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 800575
- Report Number(s):
- LBNL/ALS--43734
- Journal Information:
- Applied Physics B: Lasers and Optics, Journal Name: Applied Physics B: Lasers and Optics Journal Issue: 1 Vol. 91
- Country of Publication:
- United States
- Language:
- English
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