Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography

Journal Article · Mon Jan 01 00:00:00 EST 2001 · Applied Physics B: Lasers and Optics

OSTI ID:800575

Mirkarimi, P B; Stearns, D G; Baker, S L; Elmer, J W; Sweeney, D W; Gullikson, E M

No abstract prepared.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 800575
• Report Number(s): LBNL/ALS-43734; TRN: US0202789
• Journal Information: Applied Physics B: Lasers and Optics, Vol. 91, Issue 1; Other Information: Journal Publication Date: January 2001; PBD: 1 Jan 2001
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
DEFECTS
THIN FILMS
ADVANCED LIGHT SOURCE ALS