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Developing a viable multilayer coating process for extreme ultraviolet lithography reticles

Journal Article · Wed Dec 31 23:00:00 EST 2003 · Journal of Microlithography, Microfabrication and Microsystems

DOI:https://doi.org/10.1117/1.1631006· OSTI ID:835425

Mirkarimi, Paul B ^[1]; Spiller, Eberhard; Baker, Sherry L; Sperry, Victor; Stearns, Daniel G; Gullikson, Eric M

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Research Organization:: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 835425

Report Number(s):: LBNL--54634

Journal Information:: Journal of Microlithography, Microfabrication and Microsystems, Journal Name: Journal of Microlithography, Microfabrication and Microsystems Journal Issue: 1 Vol. 3

Country of Publication:: United States

Language:: English

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Related Subjects

42 ENGINEERING
COATINGS
EXTREME ULTRAVIOLET RADIATION
FABRICATION
OPTICAL EQUIPMENT
SURFACE COATING