Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
- LBNL Library
No abstract prepared.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 794624
- Report Number(s):
- LBNL/ALS--1516
- Journal Information:
- Optical Engineering, Journal Name: Optical Engineering Journal Issue: 7 Vol. 38; ISSN 0091-3286; ISSN OPEGAR
- Country of Publication:
- United States
- Language:
- English
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