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Mo/Si/and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography

Journal Article · Sat Apr 01 04:00:00 EST 2000 · Applied Optics

DOI:https://doi.org/10.1364/AO.39.001617· OSTI ID:800196

Mirkarimi, Paul ^[1]; Bajt, Sasa; Wall, M A

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Research Organization:: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 800196

Report Number(s):: LBNL/ALS--13666

Journal Information:: Applied Optics, Journal Name: Applied Optics Journal Issue: 10 Vol. 39; ISSN 0003-6935; ISSN APOPAI

Country of Publication:: United States

Language:: English

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Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
BERYLLIUM
MOLYBDENUM
SILICON
SUBSTRATES
THIN FILMS