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Local microstructure and stress in Al(Cu) thin film structures studied by x-ray microdiffraction

Journal Article · Sat Mar 31 23:00:00 EST 2001 · Materials Research Society Symposium Proceedings

DOI:https://doi.org/10.1557/PROC-673-P7.7· OSTI ID:800530

Valek, B C ^[1]; Tamura, N; Spolenak, R; MacDowell, A A; Celestre, R S; Padmore, H A; Bravman, J C; Brown, W L; Batterman, B W; Patel, J R

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Research Organization:: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 800530

Report Number(s):: LBNL/ALS--43519

Journal Information:: Materials Research Society Symposium Proceedings, Journal Name: Materials Research Society Symposium Proceedings Vol. 673

Country of Publication:: United States

Language:: English

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Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
MICROSTRUCTURE
THIN FILMS